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|Submit Date||Name||Organisation||Statement of capabilities/facilities|
|2020-06-26.||Jens Konrath||Infineon Technology Austria AG||Our organisation can give guidance on industrie's metrology needs and requirements. Moreover, we can provide samples of wide band gap devices new measurement techniques can be tested with.|
|2020-06-23.||Lukasz Borowik||CEA-LETI||-Experience in Kelvin Force Probe Microscopy:
(1) for calibrated work function measurements,
(2) under illumination, for photovoltage and charge carrier dynamics measurements.
-Experience in Cathodoluminescence for GaN based devices.
-Three AFM’s available: including one under UHV and one in glow box.
AFM under UHV is equipped in sample illumination system.
-Cathodoluminescence available with beam size 10 nm and cryostage 9-300 K.
|2020-06-23.||Omar El Gawhary||Delft University of Technology||Long standing expertise on optical metrology by light (coherent Fourier scatterometry, phase retrieval, scattering by nanostructures, inverse problems). Also principal scientist at VSL, in this meeting I will represent TU Delft.|
|2020-06-22.||Narciso Gambacorti||CEA-LETI||CEA-LETI is one of the major technological research institute in Europe in the field of micro- and nano-technologies. CEA-LETI is interested in participate with his in-line metrology and off-line characterization platforms.|
|2020-06-17.||Bernd Bodermann||PTB||Optical Micro- and Nanometrology: Scatterometry, Microscopy, Mueller Ellipsometry, rig. modelling, SEM, AFM and other supplementary optical metrology, hybrid metrology, metrology for semiconductor manufacturing|
|2020-06-15.||Sebastian Wood||National Physical Laboratory|
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