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Joint Research Project Participation

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Submit Date Name Organisation Statement of capabilities/facilities
2020-06-26. Jens Konrath Infineon Technology Austria AG Our organisation can give guidance on industrie's metrology needs and requirements. Moreover, we can provide samples of wide band gap devices new measurement techniques can be tested with.
2020-06-23. Lukasz Borowik CEA-LETI -Experience in Kelvin Force Probe Microscopy:
(1) for calibrated work function measurements,
(2) under illumination, for photovoltage and charge carrier dynamics measurements.

-Experience in Cathodoluminescence for GaN based devices.

-Three AFM’s available: including one under UHV and one in glow box.
AFM under UHV is equipped in sample illumination system.

-Cathodoluminescence available with beam size 10 nm and cryostage 9-300 K.
2020-06-23. Omar El Gawhary Delft University of Technology Long standing expertise on optical metrology by light (coherent Fourier scatterometry, phase retrieval, scattering by nanostructures, inverse problems). Also principal scientist at VSL, in this meeting I will represent TU Delft.
2020-06-22. Narciso Gambacorti CEA-LETI CEA-LETI is one of the major technological research institute in Europe in the field of micro- and nano-technologies. CEA-LETI is interested in participate with his in-line metrology and off-line characterization platforms.
2020-06-17. Bernd Bodermann PTB Optical Micro- and Nanometrology: Scatterometry, Microscopy, Mueller Ellipsometry, rig. modelling, SEM, AFM and other supplementary optical metrology, hybrid metrology, metrology for semiconductor manufacturing
2020-06-15. Sebastian Wood National Physical Laboratory

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